[SPIE] Effect of mask erosion on process latitudes in bilayer lithography

sjm356 Post time 2022-5-20 12:21:53 | Show all posts |Read mode
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journal£ºSPIE Proceedings

Authors£ºCharles W. Jurgensen; Anthony E. Novembre; Eric S. G. Shaqfeh

Published date£º1990-6-1

DOI£º10.1117/12.20093

Article link£ºhttp://dx.doi.org/10.1117/12.20093

Article Source£ºSPIE¡£


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