Engineering the Defect Distribution Via Boron Doping in Amorphous Tio2 for Robust Photocatalytic No Removal

Post time 2024-5-22 22:05:54

journal：

Authors：Hongbao Jia; Huan Shang; Yue He; Shuwei Gu; Shuangjun Li; Qing Wang; Shike Wang; Jinghuan Peng; Xichen Feng; Pengpeng Li; Hui Xu; Chengliang Mao; Hao Li; Shuning Xiao; Ding Wang; Guisheng Li; Dieqing Zhang

Published date：--

DOI：10.2139/ssrn.4781820

Article link：http://dx.doi.org/10.2139/ssrn.4781820

Article Source：Elsevier BV。

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Post time 2024-5-22 22:05:55

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